| Cathodic arc PVD system | TiN, TiAlN, AlTiN | Approximately 200–500°C, depending on process settings | Commonly about 1–5 μm | A widely used option for carbide and suitable high-speed-steel drills; fixturing must expose flutes and cutting edges. | High deposition rate and strong adhesion are common advantages; arc droplets can affect surface finish. |
| Filtered cathodic arc PVD system | TiAlN, AlTiN and other metal-nitride coatings | Typically within the PVD range of roughly 200–500°C | Commonly about 1–5 μm | Useful when a smoother coating surface is important on small cutting edges and flutes. | Particle filtering can reduce macroparticles, but may add system complexity and affect deposition rate. |
| Magnetron sputtering PVD system | TiN, CrN, TiAlN and related nitride coatings | Often about 150–450°C; the actual temperature depends on bias and deposition conditions | Commonly about 1–5 μm | Suitable for precision tools when uniformity and a relatively smooth film are priorities. | Generally produces fewer droplets than conventional arc deposition; deposition rate and tool rotation need evaluation. |
| HiPIMS PVD system | Dense TiN, CrN and other metal-nitride coatings | Often about 150–450°C, subject to the coating recipe and substrate limits | Commonly about 1–5 μm | Can be considered for small tools where dense films and good edge coverage are required. | Highly ionized deposition can improve film density; assess equipment cost, cycle time and process tuning requirements. |
| Hybrid arc and magnetron sputtering system | TiAlN, AlTiN and multilayer nitride coatings | Typically about 200–500°C, depending on the combined process | Commonly about 1–5 μm | Offers process flexibility for carbide or suitable high-speed-steel micro drills. | Combines deposition methods; compare control of composition, uniformity, maintenance and batch changeover. |
| Plasma-enhanced CVD system | Selected carbon-based and nitride coatings, depending on precursor chemistry | Process-dependent; some systems operate at lower temperatures than conventional thermal CVD | Varies by chemistry; often around 1–5 μm for tool coatings | Consider when the required coating chemistry and substrate temperature are compatible with the process. | Check precursor handling, coating stress, adhesion and the supplier’s validated recipes for cutting tools. |
| Thermal CVD system | TiC, TiCN and alumina-based coating systems | Typically about 800–1,050°C | Often about 5–10 μm for conventional CVD tool coatings | Generally more appropriate for temperature-tolerant carbide tools than temperature-sensitive high-speed-steel micro drills. | Higher process temperatures and thicker coatings can be unsuitable for very small drills; confirm edge geometry and substrate compatibility. |