| Thermal evaporation system | Resistive heating vaporizes a source material, which condenses onto the workpiece. | Often pumped to approximately 10−3–10−5 Pa before deposition; the required level depends on the material and coating specification. | Decorative films, mirrors, optical layers, and thin metal coatings on suitable substrates. | Relatively simple process and suitable for many straightforward, high-volume thin-film jobs. | Ask about source configuration, film-thickness control, substrate heating, usable chamber space, and uniformity across the full load. |
| Electron-beam evaporation system | An electron beam heats and evaporates material in a high-vacuum chamber. | Commonly requires high-vacuum conditions; approximately 10−3–10−5 Pa is an indicative pre-deposition range, not a universal acceptance limit. | Optical coatings, multilayer films, and materials with relatively high melting points. | Can evaporate a range of refractory materials and supports controlled multilayer deposition. | Compare beam power, source capacity, layer-control method, substrate temperature limits, and demonstrated coating uniformity. |
| Magnetron sputtering system | Plasma ions eject atoms from a target; the atoms then form a film on the substrate. | Base pressure and process pressure are different measures. Sputtering commonly operates in process gas at roughly 0.1–1 Pa; the required base pressure is application-dependent. | Metal, alloy, and compound films for glass, electronics, tools, and functional surfaces. | Works with many target materials and can produce dense, adherent films; reactive sputtering can form compounds. | Check target number and size, power supply type, reactive-gas control, pumping speed, process repeatability, and production-load uniformity. |
| Cathodic arc PVD system | An electric arc vaporizes cathode material; reactive gas may be added to form compound coatings. | Reactive coating pressure varies with the gas and recipe; approximately 0.1–5 Pa is a broad indicative process range. | Hard and wear-resistant coatings on cutting tools, dies, and selected components. | High ionization of the coating material can support dense, strongly bonded films. | Ask how macroparticles are controlled, and compare coating uniformity, component rotation, bias control, and recipe repeatability. |
| Roll-to-roll vacuum coating line | A continuous web passes through vacuum zones and coating stations; the coating source may use evaporation or sputtering. | Vacuum and coating pressure depend on the source technology, web material, line layout, and target production rate. | Flexible films, packaging, decorative webs, and other continuous sheet materials. | Designed for continuous processing and high-area production rather than individual batch loading. | Compare web width, line speed at the required film specification, tension control, zone layout, changeover time, and actual throughput data. |
| Practical selection criterion | Match the coating method to the workpiece, coating material, required properties, and production volume. | Request written, application-specific base-pressure and process-pressure specifications; do not compare unlike pressure figures. | Suitable for evaluating any machine category before requesting a quotation. | The best machine is the one that reliably meets the coating specification and production target at an acceptable operating cost. | Ask for a sample run, coating test results, a defined acceptance checklist, utility requirements, warranty terms, spare-parts support, and references for comparable applications. |